Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• plasma chemistry [34]. These resists are polymerized from the C60 molecule, selected for its sub-nanometre dimensions (0.7 nm) and its stability [35]. Resist screening experiments on one of these resists with the experimental codename HM-01 have revealed exceptional plasma etch resistance and stability

Bombyx mori silk/titania/gold hybrid materials for photocatalytic water splitting: combining renewable raw materials with clean fuels

• Stefanie Krüger,
• Michael Schwarze,
• Otto Baumann,
• Christina Günter,
• Michael Bruns,
• Christian Kübel,
• Dorothée Vinga Szabó,
• Rafael Meinusch,
• Verónica de Zea Bermudez and
• Andreas Taubert

Beilstein J. Nanotechnol. 2018, 9, 187–204, doi:10.3762/bjnano.9.21

• a scaffold for photocatalyst synthesis. Instead of plasma chemistry, however, we employed a much softer wet chemistry method for materials synthesis. B. mori silk contains numerous amino acids, predominantly glycine, alanine, serine, and tyrosine [37][38]. As numerous amide and hydroxyl groups are

Advances and challenges in the field of plasma polymer nanoparticles

• Andrei Choukourov,
• Pavel Pleskunov,
• Daniil Nikitin,
• Valerii Titov,
• Artem Shelemin,
• Mykhailo Vaidulych,
• Anna Kuzminova,
• Pavel Solař,
• Jan Hanuš,
• Jaroslav Kousal,
• Ondřej Kylián,
• Danka Slavínská and
• Hynek Biederman

Beilstein J. Nanotechnol. 2017, 8, 2002–2014, doi:10.3762/bjnano.8.200

• environments can be present. The choice of the working gas strongly influences the plasma chemistry and may be used as a tool for tuning the chemical composition of resultant NPs. For example, adding nitrogen to a hydrocarbon plasma may trigger the formation of nitrogen-containing NPs [68][69]. Figure 5a,b

• composition of the gas mixture can be found for plasma polymerization of HMDSO. It has been known for a long time in the thin film deposition community that adding oxygen to HMDSO switches plasma chemistry to preferential oxidation of carbonaceous species. A pumping system effectively evacuates gaseous carbon

• larger (250 nm) as compared to the ones fabricated with the weaker magnetic field (30 nm). Apparently, the differences in intensity of ion bombardment should be manifested in the change of the plasma chemistry, although the exact reason for this interesting phenomenon is still not clear and requires

Fluorination of vertically aligned carbon nanotubes: from CF₄ plasma chemistry to surface functionalization

• Claudia Struzzi,
• Mattia Scardamaglia,
• Jean-François Colomer,
• Alberto Verdini,
• Luca Floreano,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2017, 8, 1723–1733, doi:10.3762/bjnano.8.173

• CF4 plasma chemistry has been performed focusing on the evaluation of the lifetime of plasma species and density distribution [5][6], considering the reaction with the walls of the chamber [7], and determining the role of molecular oxygen [8][9][10] or hydrogen [11] in the gas mixture. Progressively

• electronic properties of fluorinated vCNT is discussed as a function of the fluorine content and ageing effects are verified after storing the samples for two weeks under ambient conditions. Results and Discussion In the present work, we combine the study of the CF4 plasma chemistry with the analysis of the

• plasma chemistry analysis. In the plasma discharge, the density of CF and CF2 species increases for increasing power until a reaction takes place and this competitive effect reduces the density of these species at high power. The fluorine content increases on the sample surface for prolonged exposure

Process-specific mechanisms of vertically oriented graphene growth in plasmas

• Subrata Ghosh,
• Shyamal R. Polaki,
• Niranjan Kumar,
• Sankarakumar Amirthapandian,
• Mohamed Kamruddin and
• Kostya (Ken) Ostrikov

Beilstein J. Nanotechnol. 2017, 8, 1658–1670, doi:10.3762/bjnano.8.166

• have observed the effect of various process parameters such as carrier gas, nature of substrate, total pressure and microwave power on the growth of VGNs. However, the plasma chemistry and chemical reactions with the substrate surface during growth are still a matter of study [9][27][28][29][30][31][32

• and structure of the VGNs, in particular using the plasma chemistry considerations. Here we aim to study the role of the three key parameters such as the substrate temperature, microwave power and the distance from plasma source to substrate in electron cyclotron resonance (ECR)-PECVD to control the

Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?

• Baran Eren,
• Dorothée Hug,
• Laurent Marot,
• Rémy Pawlak,
• Marcin Kisiel,
• Roland Steiner,
• Dominik M. Zumbühl and
• Ernst Meyer

Beilstein J. Nanotechnol. 2012, 3, 852–859, doi:10.3762/bjnano.3.96

• performed 5 cm away from the sample where an average Te of 3.5 ± 0.5 eV and an ion flux of 1.5 ± 0.5 × 1015 cm−2s−1 were obtained. The exact plasma chemistry of the hydrogen ions (H+, H2+, H3+) was not known, therefore an estimate of 2 a.m.u. was used as the average ion mass, which introduces ≈10